| TSMC 0.13-micron process technology delivers the
optimal combination of gate density, speed and power to serve a broad
range of computing, communications and consumer electronics applications.
The technology achieves die size reduction by nearly 40 percent and
speed improvement by as much as 70 percent when compared to the 0.18-micron
process.
The
0.13-micron technology comes with logic process, mixed-signal/RF
and embedded memory (6T SRAM, eDRAM, emFlash, OTP, eFuse), making
the technology ideal for a variety of system-on-chip (SOC) applications.
The 0.13-micron logic family includes the general purpose (G), low
power (LP) and high performance low voltage (LV) process options.
Each process supports multiple Vt options, including standard Vt,
low Vt and high Vt.
TSMC has multiple fabs to support 0.13-micron volume production,
making it the only foundry capable of fulfilling surge demands during
market upswings. Both 8-inch and 12-inch process lines are available
with sufficient capacity. TSMC has shipped more than four million
8-inch equivalent wafers to hundreds of customers since the technology
was introduced in 2000.
An extensive array of libraries and IP from TSMC as well as from
industry leading library vendors, have been silicon verified and
volume proven in the 0.13-micron technology. Please refer to Design
Services for full details.
TSMC offered a 0.11-micron process in 2003, and has shipped close
to one million 8-inch equivalent wafers ever since. Half node technologies
have proven to be effective in providing a cost competitive solution
while maintaining similar levels of device performance as the full
node. As a migration path from 0.18-micron or 0.16-micron, the 0.11-micron
process has been as popular as the 0.13-micron process. Mixed signal
and RF is fully supported in the 0.11-micron G process.

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